An insulating layer structure can be formed on a photodiode region and can include a trench. 可以在光电二极管区域上形成可包含沟槽的绝缘层结构。
The isolation trench has sidewalls and upper and lower portions, and encircles an area of the semiconductor body which contains the memory cells. 隔离沟槽具有侧壁及上和下部,并包围包含存储单元的半导体本体的区域。